Reverse graded relaxed buffers for high Ge content SiGe virtual substrates
نویسندگان
چکیده
منابع مشابه
High-quality Ge films on Si substrates using Sb surfactant-mediated graded SiGe buffers
High-quality Ge films were grown on Si substrates by solid-source molecular beam epitaxy using SiGe graded layer and Sb surfactant-mediation technique. Transmission electron microscopy measurements show that samples grown using this method have a lower threading dislocation density than those grown by other typical methods, such as grading at high temperature ~700 °C! only, grading at intermedi...
متن کاملSb surfactant - mediated SiGe graded layers for Ge photodiodes integrated on
High-quality SiGe and Ge thin films were grown on Si substrates by molecular-beam epitaxy using a technique that combines SiGe composition grading and Sb surfactant mediation. Both transmission electron microscopy and Schimmel defect etch measurements show that the Sb surfactant-mediated SiGe graded buffer layers have lower dislocation densities than those without an Sb surfactant. A systematic...
متن کاملDislocations in Relaxed SiGe/Si Heterostructures
Recent advances in the understanding and control of threading dislocations in substantially relaxed SiGe buffer layers on Si are presented. A model for threading dislocation flow in relaxed graded SiGe buffers is used to determine the potential lower limit of threading dislocation density in relaxed SiGe buffers. Greater densities than expected from the model are seen in relaxed graded alloys w...
متن کاملKirkendall void formation in reverse step graded Si1−xGex/Ge/Si(001) virtual substrates
Formation of Kirkendall voids is demonstrated in the Ge underlayer of reverse step graded Si1−xGex/Ge buffer layers grown on Si(001) using reduced pressure chemical vapour deposition (RP-CVD). This phenomenon is seen when the constant composition Si1−xGex layer is grown at high temperatures and for x0.7. The density and size of the spherical voids can be tuned by changing Ge content in the S...
متن کاملMOSFET Channel Engineering using Strained Si, SiGe, and Ge Channels
Biaxial tensile strained Si grown on SiGe virtual substrates will be incorporated into future generations of CMOS technology due to the lack of performance increase with scaling. Compressively strained Ge-rich alloys with high hole mobilities can also be grown on relaxed SiGe. We review progress in strained Si and dual channel heterostructures, and also introduce high hole mobility digital allo...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
عنوان ژورنال:
دوره شماره
صفحات -
تاریخ انتشار 2008